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 Efficient technologies for the glass industry  

Thin-film vacuum deposition

Our recommendations

Cathodic sputtering


  • +Suitable for pure metal or compound (nitrides, oxides, etc.) deposition applications
  • +Can also be used for depositing precursors such as ultra-pure metals and various reactive gases
  • +Higher UV and IR reflectivity

Chemical vapor deposition


  • +Fast, economical process
  • +Precise temperature control
  • +Fewer steps involved
  • +Better adhesion than with sputtering
  • +Coating retains its integrity even after bonding

See also